There are two photolithography systems: one with light source of wavelength λ1 = 156 nm (System 1) and another with light source of
Q. There are two photolithography systems: one with light source of wavelength λ1 = 156 nm (System 1) and another with light source of wavelength λ2 = 325 nm (System 2). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using System1 and System2 are Lmin1 and Lmin2 respectively, the ratio Lmin1/Lmin2 (correct to two decimal places) is .
Ans: 0.47 – 0.51
Sol:
